Effects of nitrogen trifluoride on the properties of plasma-enhanced chemical-vapor-deposited semi-insulating polysilicon films
R.M. Ranade, S.S. Ang, W.D. BrownVolume:
258
Year:
1995
Language:
english
Pages:
7
DOI:
10.1016/0040-6090(94)06364-8
File:
PDF, 778 KB
english, 1995