![](/img/cover-not-exists.png)
Room-temperature, high-deposition-rate, plasma-enhanced chemical vapour deposition of silicon oxynitride thin films producing low surface damage on lattice-matched and pseudomorphic III–V quantum-well structures
R.E. Sah, J.D. Ralston, G. Eichin, B. Dischler, W. Rothemund, J. Wagner, E.C. Larkins, H. BaumannVolume:
259
Year:
1995
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(94)06446-6
File:
PDF, 583 KB
english, 1995