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Deposition of thick doped polysilicon films with low stress in an epitaxial reactor for surface micromachining applications
M. Kirsten, B. Wenk, F. Ericson, J.Å. Schweitz, W. Riethmüller, P. LangeVolume:
259
Year:
1995
Language:
english
Pages:
7
DOI:
10.1016/0040-6090(94)06449-0
File:
PDF, 751 KB
english, 1995