Deposition of thick doped polysilicon films with low stress...

Deposition of thick doped polysilicon films with low stress in an epitaxial reactor for surface micromachining applications

M. Kirsten, B. Wenk, F. Ericson, J.Å. Schweitz, W. Riethmüller, P. Lange
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Volume:
259
Year:
1995
Language:
english
Pages:
7
DOI:
10.1016/0040-6090(94)06449-0
File:
PDF, 751 KB
english, 1995
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