Chemical stability of hydrogen-containing boron nitride films obtained by plasma enhanced chemical vapour deposition
Z.L. Akkerman, M.L. Kosinova, N.I. Fainer, Yu.M. Rumjantsev, N.P. SysoevaVolume:
260
Year:
1995
Language:
english
Pages:
5
DOI:
10.1016/0040-6090(94)06464-4
File:
PDF, 496 KB
english, 1995