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Dielectric properties of AlN films prepared by laser-induced chemical vapour deposition
X. Li, T.L. Tansley, V.W.L. ChinVolume:
250
Year:
1994
Language:
english
Pages:
5
DOI:
10.1016/0040-6090(94)90195-3
File:
PDF, 387 KB
english, 1994