Millitorr range PECVD of a-SiO2 films using TEOS and oxygen
F. Templier, L. Vallier, R. Madar, J.-C. Oberlin, R.A.B. DevineVolume:
241
Year:
1994
Language:
english
Pages:
4
DOI:
10.1016/0040-6090(94)90435-9
File:
PDF, 330 KB
english, 1994