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Optimization of a-Si1−xCx: H films prepared by ultrahigh vacuum plasma enhanced chemical vapour deposition for electroluminescent devices
F. Demichelis, G. Crovini, C.F. Pirri, E. Tresso, G. Amato, U. Coscia, G. Ambrosone, P. RavaVolume:
241
Year:
1994
Language:
english
Pages:
4
DOI:
10.1016/0040-6090(94)90440-5
File:
PDF, 376 KB
english, 1994