Controlled growth of tin dioxide thin films by atomic layer...

Thin Solid Films 1994 Vol. 249; Iss. 2

Controlled growth of tin dioxide thin films by atomic layer epitaxy

H Viirola, L Niinistö
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Volume:
249
Year:
1994
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(94)90752-8
File:
PDF, 430 KB
english, 1994
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