Strain relaxation in ultrathin epitaxial films of β-FeSi2 on unstrained and strained Si(100) surfaces
D.R. Peale, R. Haight, F.K. LeGouesVolume:
264
Year:
1995
Language:
english
Pages:
12
DOI:
10.1016/0040-6090(95)06568-7
File:
PDF, 1.54 MB
english, 1995