Thin-oxide MOS damage caused by wafer charging in...

Thin-oxide MOS damage caused by wafer charging in magnetized helium plasma

E. Atanassova
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Volume:
264
Year:
1995
Language:
english
Pages:
10
DOI:
10.1016/0040-6090(95)06585-7
File:
PDF, 1.29 MB
english, 1995
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