Hydrogenated aluminum nitride thin films prepared by r.f. reactive sputtering. Infrared and structural properties
J.C. Loretz, B. Despax, P. Marti, A. MazelVolume:
265
Year:
1995
Language:
english
Pages:
7
DOI:
10.1016/0040-6090(95)06605-5
File:
PDF, 710 KB
english, 1995