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Boron and phosphorus doping of a-SiC:H thin films by means of ion implantation
F. Demichelis, G. Crovini, C.F. Pirri, E. Tresso, R. Galloni, C. Summonte, R. Rizzoli, F. Zignani, P. RavaVolume:
265
Year:
1995
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(95)06618-7
File:
PDF, 618 KB
english, 1995