Reactive ion etching of vapor phase deposited polyimide...

Thin Solid Films 1996 Vol. 274; Iss. 1-2

Reactive ion etching of vapor phase deposited polyimide films in CF4O2: effect on surface morphology

K. Popova, E. Spassova, I. Zhivkov, G. Danev
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Volume:
274
Year:
1996
Language:
english
Pages:
4
DOI:
10.1016/0040-6090(95)07077-x
File:
PDF, 440 KB
english, 1996
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