Analysis of the oxidation kinetics and barrier layer properties of ZrN and Pt/Ru thin films for DRAM applications
H.N. Al-Shareef, X. Chen, D.J. Lichtenwalner, A.I. KingonVolume:
280
Year:
1996
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(95)08194-1
File:
PDF, 1.56 MB
english, 1996