Properties of HfO2/ultrathin SiO2/Si structures and their...

Applied Surface Science 2014 / 05 Vol. 301

Properties of HfO2/ultrathin SiO2/Si structures and their comparison with Si MOS structures passivated in KCN solution

Pinčík, Emil, Kobayashi, Hikaru, Matsumoto, Taketoshi, Takahashi, Masao, Mikula, Milan, Brunner, Róbert
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Volume:
301
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2014.01.113
Date:
May, 2014
File:
PDF, 677 KB
english, 2014
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