Nanostructured silicon carbon thin films grown by plasma enhanced chemical vapour deposition technique
Coscia, U., Ambrosone, G., Basa, D.K., Rigato, V., Ferrero, S., Virga, A.Volume:
543
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2013.03.073
Date:
September, 2013
File:
PDF, 454 KB
english, 2013