Deposition and properties of silicon oxynitride films with...

Deposition and properties of silicon oxynitride films with low propagation losses by inductively coupled PECVD at 150°C

Rangarajan, Balaji, Kovalgin, Alexey Y., Schmitz, Jurriaan
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Volume:
230
Language:
english
Journal:
Surface and Coatings Technology
DOI:
10.1016/j.surfcoat.2013.06.010
Date:
September, 2013
File:
PDF, 398 KB
english, 2013
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