Structural and Electrical Properties of Titanium-Doped...

Energy Procedia 2013 Vol. 34

Structural and Electrical Properties of Titanium-Doped Indium Oxide Films Deposited by RF Sputtering

Chaoumead, Accarat, Park, Hee-Dae, Joo, Bong-Hyun, Kwak, Dong-Joo, Park, Min-Woo, Sung, Youl-Moon
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Volume:
34
Year:
2013
Language:
english
Journal:
Energy Procedia
DOI:
10.1016/j.egypro.2013.06.787
File:
PDF, 879 KB
english, 2013
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