Atmospheric-pressure plasma-enhanced chemical vapor deposition of electrochromic organonickel oxide thin films with an atmospheric pressure plasma jet
Lin, Yung-Sen, Lin, Di-Jiun, Sung, Ping-Ju, Tien, Shih-WeiVolume:
532
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2012.11.100
Date:
April, 2013
File:
PDF, 1.15 MB
english, 2013