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Shear thickening and defect formation of fumed silica CMP slurries
Crawford, Nathan C., Williams, S. Kim R., Boldridge, David, Liberatore, Matthew W.Volume:
436
Language:
english
Journal:
Colloids and Surfaces A: Physicochemical and Engineering Aspects
DOI:
10.1016/j.colsurfa.2013.06.003
Date:
September, 2013
File:
PDF, 3.21 MB
english, 2013