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High purity Si–C–N thin films with tailored composition on the tie line SiC–Si3N4
Rudolphi, M., Bruns, M., Baumann, H., Geckle, U.Volume:
16
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/j.diamond.2006.12.037
Date:
April, 2007
File:
PDF, 549 KB
english, 2007