Internal stress of a-C:H(N) films deposited by radio frequency plasma enhanced chemical vapor deposition
Cheng, Y.H, Wu, Y.P, Chen, J.G, Qiao, X.L, Xie, C.SVolume:
8
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/S0925-9635(99)00099-0
Date:
July, 1999
File:
PDF, 178 KB
english, 1999