Local structural analysis of a-SiCx:H films formed by...

Diamond and Related Materials 2011 / 3 Vol. 20; Iss. 3

Local structural analysis of a-SiCx:H films formed by decomposition of tetramethylsilane in microwave discharge flow of Ar

Wada, Akira, Ogaki, Takeshi, Niibe, Masahito, Tagawa, Masahito, Saitoh, Hidetoshi, Kanda, Kazuhiro, Ito, Haruhiko
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Volume:
20
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/j.diamond.2011.01.020
Date:
March, 2011
File:
PDF, 477 KB
english, 2011
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