Fluorocarbon film-assisted fabrication of a CoNi mold with high aspect ratio for nanoimprint lithography
Muhammad, Rizwan, Cho, Si-Hyeong, Lee, Jung-Hwan, Park, Jin-GooVolume:
104
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2012.11.006
Date:
April, 2013
File:
PDF, 1.02 MB
english, 2013