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A brief review of atomic layer deposition: from fundamentals to applications
Johnson, Richard W., Hultqvist, Adam, Bent, Stacey F.Volume:
17
Language:
english
Journal:
Materials Today
DOI:
10.1016/j.mattod.2014.04.026
Date:
June, 2014
File:
PDF, 2.29 MB
english, 2014