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Plasma enhanced deposition of ‘silicon nitride’ for use as an encapsulant for silicon ion-implanted gallium arsenide
DC Bartle, DC Andrews, JD Grange, PG Harris, AD Trigg, DK WickendenVolume:
34
Year:
1984
Language:
english
Pages:
6
DOI:
10.1016/0042-207x(84)90148-9
File:
PDF, 422 KB
english, 1984