A modified ion source for semiconductor implantation...

A modified ion source for semiconductor implantation purposes

A Latuszyński, D Máczka, Yu V Yushkievich, K Kiszczak
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Volume:
36
Year:
1986
Language:
english
Pages:
3
DOI:
10.1016/0042-207x(86)90603-2
File:
PDF, 274 KB
english, 1986
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