Growth of tungsten silicide films by low pressure CVD...

Vacuum 1987 Vol. 37; Iss. 3-4

Growth of tungsten silicide films by low pressure CVD method

Jiann-Ruey Chen, Yean-Kuen Fang, Shun-Liang Hsu
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Volume:
37
Year:
1987
Language:
english
Pages:
5
DOI:
10.1016/0042-207x(87)90025-x
File:
PDF, 564 KB
english, 1987
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