Low temperature pulsed plasma deposition. Part I—a new...

Low temperature pulsed plasma deposition. Part I—a new technique for thin film deposition with complete gas dissociation

G. Scarsbrook, I.P. Llewellyn, S.M. Ojha, R.A. Heinecke
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Volume:
38
Year:
1988
Language:
english
Pages:
5
DOI:
10.1016/0042-207x(88)90431-9
File:
PDF, 889 KB
english, 1988
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