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Low temperature pulsed plasma deposition. Part I—a new technique for thin film deposition with complete gas dissociation
G. Scarsbrook, I.P. Llewellyn, S.M. Ojha, R.A. HeineckeVolume:
38
Year:
1988
Language:
english
Pages:
5
DOI:
10.1016/0042-207x(88)90431-9
File:
PDF, 889 KB
english, 1988