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Application of dynamic in-situ ellipsometry and quadrupole mass spectrometry to plasma-assisted etching: Polymer formation and removal
MC Flowers, R Greef, CMK Starbuck, P Southworth, DJ ThomasVolume:
40
Year:
1990
Language:
english
Pages:
7
DOI:
10.1016/0042-207x(90)90001-f
File:
PDF, 839 KB
english, 1990