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The influence of the substrate temperature on the formation of buried epitaxial CoSi2 by ion implantation
K Radermacher, S Mantl, K KohlhofVolume:
41
Year:
1990
Language:
english
Pages:
3
DOI:
10.1016/0042-207x(90)93857-f
File:
PDF, 291 KB
english, 1990