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Diffusion of hydrogen in low pressure chemical vapour deposited silicon nitride films
W.M. Arnold Bik, R.N.H. Linssen, F.H.P.M. Habraken, W.F. van der Weg, A.E.T. KuiperVolume:
41
Year:
1990
Language:
english
Pages:
2
DOI:
10.1016/0042-207x(90)93860-l
File:
PDF, 199 KB
english, 1990