Fabrication of AIN thin films by reactive ionized cluster beam deposition technique
M. Koshinaka, H. Fujii, K. Nakanishi, Y. ShibuyaVolume:
41
Year:
1990
Language:
english
Pages:
3
DOI:
10.1016/0042-207x(90)94148-j
File:
PDF, 227 KB
english, 1990