Impact of plasma treatment on structure and electrical...

Thin Solid Films 2013 / 10 Vol. 544

Impact of plasma treatment on structure and electrical properties of porous low dielectric constant SiCOH material

Cheng, Yi-Lung, Huang, Jun-Fu, Chang, Yu-Min, Leu, Jihperng
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Volume:
544
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2012.12.074
Date:
October, 2013
File:
PDF, 397 KB
english, 2013
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