![](/img/cover-not-exists.png)
Modelling of deep silicon etching in multicomponent plasma
MK Abachev, YuP Baryshev, VF Lukichev, AA OrlikovskyVolume:
43
Year:
1992
Language:
english
Pages:
2
DOI:
10.1016/0042-207x(92)90078-b
File:
PDF, 194 KB
english, 1992