Ion beam lithography for direct patterning of high accuracy...

Microelectronic Engineering 2012 / 10 Vol. 98

Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes

Nadzeyka, A., Peto, L., Bauerdick, S., Mayer, M., Keskinbora, K., Grévent, C., Weigand, M., Hirscher, M., Schütz, G.
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Volume:
98
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2012.07.036
Date:
October, 2012
File:
PDF, 1.17 MB
english, 2012
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