Early-stage diffusion processes at Si/Me and Me/Me...

Vacuum 1995 Vol. 46; Iss. 8-10

Early-stage diffusion processes at Si/Me and Me/Me interfaces

A Zalar, S Hofmann, F Pimentel, D Kohl, P Panjan
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Volume:
46
Year:
1995
Language:
english
Pages:
5
DOI:
10.1016/0042-207x(95)00110-7
File:
PDF, 615 KB
english, 1995
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