Design and fabrication of densely integrated silicon...

Microelectronic Engineering 2012 / 10 Vol. 98

Design and fabrication of densely integrated silicon quantum dots using a VLSI compatible hydrogen silsesquioxane electron beam lithography process

Lin, Y.P., Husain, M.K., Alkhalil, F.M., Lambert, N., Perez-Barraza, J., Tsuchiya, Y., Ferguson, A.J., Chong, H.M.H., Mizuta, H.
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Volume:
98
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2012.07.011
Date:
October, 2012
File:
PDF, 774 KB
english, 2012
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