Selective wet etching of Si3N4/SiO2 in phosphoric acid with the addition of fluoride and silicic compounds
Seo, Dongwan, Bae, Jin Sung, Oh, Eunseok, Kim, Solbaro, Lim, SangwooVolume:
118
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.12.027
Date:
April, 2014
File:
PDF, 497 KB
english, 2014