Silicon etch using SF6/C4F8/Ar gas mixtures

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2014 / 07 Vol. 32; Iss. 4

Silicon etch using SF6/C4F8/Ar gas mixtures

Bates, Robert L.
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Volume:
32
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4880800
Date:
July, 2014
File:
PDF, 1.67 MB
english, 2014
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