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Influence of the Oxygen Substoichiometry and of the Hydrogen Incorporation on the Electronic Band Structure of Amorphous Tungsten Oxide Films
Vasilopoulou, Maria, Kostis, Ioannis, Vourdas, Nikolaos, Papadimitropoulos, Giorgos, Douvas, Antonios, Boukos, Nikolaos, Kennou, Stella, Davazoglou, DimitrisVolume:
118
Language:
english
Journal:
The Journal of Physical Chemistry C
DOI:
10.1021/jp502092h
Date:
June, 2014
File:
PDF, 3.00 MB
english, 2014