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Extended Random Sequential Adsorption Model of Irreversible Deposition Processes: From Simulations to Experiments
P. Lavalle, P. Schaaf, M. Ostafin, J.-C. Voegel and B. SengerVolume:
96
Language:
english
Journal:
Proceedings of the National Academy of Sciences of the United States of America
DOI:
10.2307/48996
Date:
September, 1999
File:
PDF, 1.08 MB
english, 1999