Kinetic aspects of plasma etching of polyimide in CF4O2 discharges
P.M. Scott, S.V. Babu, R.E. Partch, L.J. MatienzoVolume:
27
Year:
1990
Language:
english
Pages:
13
DOI:
10.1016/0141-3910(90)90107-i
File:
PDF, 597 KB
english, 1990