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Relationship between Condition of Deposition and Properties of W-Ti-N Thin Films Prepared by Reactive Magnetron Sputtering
A. V. Kuchuk, V. P. Kladko, O. S. Lytvyn, A. Piotrowska, R. A. Minikayev, R. RatajczakVolume:
8
Year:
2006
Language:
english
Pages:
4
DOI:
10.1002/adem.200500263
File:
PDF, 313 KB
english, 2006