Novel dual-mode photoresist based on cationic polymerization and acidolysis
Moon, Seongyun, Naitoh, Kazuhiko, Yamaoka, TsuguoVolume:
5
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm00033a022
Date:
September, 1993
File:
PDF, 1.34 MB
english, 1993