Direct Comparison of ZrO 2 and...

Japanese Journal of Applied Physics 2005 / 4 Vol. 44; Iss. 4B

Direct Comparison of ZrO 2 and HfO 2 on Ge Substrate in Terms of the Realization of Ultrathin High-κ Gate Stacks

Kamata, Yoshiki, Kamimuta, Yuuichi, Ino, Tsunehiro, Nishiyama, Akira
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.2323
Date:
April, 2005
File:
PDF, 482 KB
english, 2005
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