Colloid Monolayers as Versatile Lithographic Masks

Langmuir 1997 / 05 Vol. 13; Iss. 11

Colloid Monolayers as Versatile Lithographic Masks

Burmeister, Frank, Schäfle, Claudia, Matthes, Thomas, Böhmisch, Matthias, Boneberg, Johannes, Leiderer, Paul
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Volume:
13
Language:
english
Journal:
Langmuir
DOI:
10.1021/la9621123
Date:
May, 1997
File:
PDF, 256 KB
english, 1997
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