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[IEEE IEEE International Electron Devices Meeting - San Francisco, CA, USA (8-11 Dec. 2002)] Digest. International Electron Devices Meeting, - Novel locally strained channel technique for high performance 55nm CMOS
Ota, K., Sugihara, K., Sayama, H., Uchida, T., Oda, H., Eimori, T., Morimoto, H., Inoue, Y.Year:
2002
Language:
english
DOI:
10.1109/IEDM.2002.1175771
File:
PDF, 222 KB
english, 2002