Critical assessment of the determination of residual stress...

Thin Solid Films 2014 / 08 Vol. 564

Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method

Schöngrundner, R., Treml, R., Antretter, T., Kozic, D., Ecker, W., Kiener, D., Brunner, R.
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Volume:
564
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2014.06.003
Date:
August, 2014
File:
PDF, 1.78 MB
english, 2014
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