Silicate layer formation at HfO2/SiO2/Si interface...

Silicate layer formation at HfO2/SiO2/Si interface determined by x-ray photoelectron spectroscopy and infrared spectroscopy

G. He, L. D. Zhang, Q. Fang
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
100
Year:
2006
Language:
english
DOI:
10.1063/1.2361161
File:
PDF, 103 KB
english, 2006
Conversion to is in progress
Conversion to is failed